Park NX10

  • Park NX10 supplier

Park NX10

Park NX10 produces data you can trust, replicate, and publish at the highest nano resolution. From sample setting to full scan imaging, measurement, and analysis, Park NX10 saves you time every step of the way. With more time and better data, you can focus on doing more innovative research.

Product Description

Innovative feature for innovative work


Park SmartScan Auto Mode

SmartScan Auto performs all the necessary operations for imaging and intelligently decides on the optimum image quality and scan speed, all autonomously. SmartScan Auto is made possible by Park’s proprietary enabling technologies. That saves you time, money, and makes for a better end result.


Park Crosstalk Elimination Technology

Park NX10 produces data you can trust, replicate, and publish at the highest nano resolution. It features the world’s only true non-contact AFM that prolongs tip life while preserving your sample, and flexure based independent XY and Z scanner for unparalleled accuracy and resolution.


Park AFM Modes

Park AFMs feature a comprehensive range of scanning modes so you can collect a wide array of data types accurately and efficiently. From the world’s only true non-contact mode that preserves tip sharpness and sample integrity to advanced Magnetic Force Microscopy, Park offers the most innovative, accurate modes in the AFM industry.


Park NX10 SICM Module

Park NX10 SICM Module provides nanoscale imaging for a wide range of applications, Cell Biology, Analytical Chemistry, Electrophysiology, Neuroscience.


Accurate AFM Solutions for General Research

Tall Sample 1.5 µm step height


  • Scan Mode: Non-contact mode, Topography from Z position sensor

Flat Sample Atomic steps of sapphire wafer


  • 0.3 nm step height, Scan Mode: Non-contact mode, Topography from Z position sensor

Hard Sample Tungsten film


  • Scan Mode: Non-contact mode, Topography from Z position sensor

Soft Sample Collagen fibril


  • Scan Mode: Non-contact mode, Topography from Z position sensor

Accurate AFM Measurement with Low Noise Z Detector

Low Noise Z Detector of Park nx10 AFM

  • Key technological advance and design feature of NX platform
  • Noise level is the lowest in the industry, unmatched by any other
  • Used as the default topography signal

The Z detector is the key technological advance of the new NX-series AFM. It is a new type of strain gauge sensor, innovated by Park. At 0.2 Angstrom, it is the best Z-detector noise in the industry. The noise level is low enough for Z-detector to be used as the default topography signal. If we compare the new NX-series AFM with previous generation of our AFM model, XE, one can tell the difference. If the Z-detector noise is too high, one cannot clearly observe the atomic steps on sapphire wafer. The height signal from the Z detector of the Park NX AFM has the noise level, identical to that of the Z-voltage-based topography.


Park NX Series

Z-detector-img-nx The noise level of the Z position detectors of the Park NX

Z-detector-img-nx2 The topography images of a sapphire wafer obtained from nx10

Park XE Series

Z-detector-img-xe The noise level of the Z position detectors of the Park XE

Z-detector-img-xe2 The topography images of a sapphire wafer obtained from XE-100

Accurate AFM Scan by True Non-Contact™ Mode

True Non-Contact™ Mode


  • Less tip wear = Prolonged high-resolution scan
  • Non-destructive tip-sample interaction = Minimized sample modification
  • Immunity from parameter dependent results


Tapping Imaging


  • Quick tip wear = Blurred low-resolution scan
  • Destructive tip-sample interaction = Sample damage and modification
  • Highly parameter-dependent



The Best User Convenience by Design

Easy Tip and Sample Exchange


The unique head design allows easy side access allowing you to easily snap new tips and samples into place by hand. The cantilever is ready for scanning without the need for any tricky laser beam alignment by using pre-aligned cantilevers mounted on to the cantilever tip holder.

Lightning Fast Automatic Tip Approach


Our automatic tip to sample approach requires no user intervention and engages in just 10 seconds after loading the cantilever. By monitoring the cantilever response to the approaching surface, Park NX10 can initiate an automatic fast tip to sample approach within 10 seconds of cantilever loading. Fast feedback by the high speed Z scanner and low noise signal processing by the NX electronics controller enable quick engagement to the sample surface without any user intervention. It just works, minimal user involvement required.

Easy, Intuitive Laser Beam Alignment


With our advanced pre-aligned cantilever holder, the laser beam is focused on the cantilever upon placement. Furthermore, the natural on-axis top-down view, the only one in the industry, allows you to easily find the laser spot. Since the laser beam falls vertically on the cantilever, you can intuitively move the laser spot along the X- and Y-axis by rotating its two positioning knobs. As a result, you can easily find the laser and position it on PSPD using our beam alignment user interface. From there, all you will need is a minor adjustment to maximize the signal to start acquiring the data.


Park NX10 Specifications

Z Scanner

Guided high-force flexure scanner
Scan range : 15 µm (optional 30 µm)
Resolution : 0.015 nm
Position detector noise : 0.03 nm (bandwidth: 1 kHz)
Resonant frequency : > 9 kHz (typically 10.5 kHz)


XY Scanner

Single module flexure XY-scanner with closed-loop control
50 µm × 50 µm (optional 10 µm × 10 µm or 100 µm × 100 µm)
Resolution : 0.05 nm
Position detector noise : < 0.25 nm (bandwidth: 1 kHz)
Out-of-plane motion : < 2 nm (over 40 µm scan)



Z stage range : 25 mm
Focus travel range : 15 mm
XY stage travel range : 20 mm x 20 mm
Sample size : Open space up to 100 mm x 100 mm, thickness up to 20 mm
Sample weight : < 500 g



10x (0.21NA) ultra-long working distance lens (1µm resolution)
20x (0.42 NA) high-resolution, long working distance lens (0.6 µm resolution)
Direct on-axis vision of sample surface and cantilever
Field-of-view : 480 × 360 µm (with 10× objective lens)
CCD : 1 Mpixel (pixel resolution: 0.4 µm)




Dedicated system control and data acquisition software
Adjusting feedback parameters in real time
Script-level control through external programs(optional)


AFM data analysis software



Signal processing

ADC : 18 channels
4 high-speed ADC channels (64 MSPS)
24-bit ADCs for X, Y, and Z scanner position sensor
DAC : 12 channels
2 high-speed DAC channels (64 MSPS)
20-bit DACs for X, Y, and Z scanner positioning
Maximum data size : 4096 x 4096 pixels

Integrated functions

3 channels of flexible digital lock-in amplifier
Spring constant calibration (Thermal method, optional)
Digital Q control

External signal access

20 embedded signal input/output ports
5 TTL outputs : EOF, EOL, EOP, Modulation, and AC bias


AFM Modes
(*Optionally available)

Standard Imaging

True Non-Contact AFM
PinPoint™ AFM
Basic Contact AFM
Lateral Force Microscopy (LFM)
Phase Imaging
Intermittent (tapping) AFM

Force Measurement*

Force Distance (FD) Spectroscopy
Force Volume Imaging

Dielectric/Piezoelectric Properties*

Electric Force Microscopy (EFM)
Dynamic Contact EFM (EFM-DC)
Piezoelectric Force Microscopy (PFM)
PFM with High Voltage

Mechanical Properties*

Force Modulation Microscopy (FMM)
Nanolithography with High Voltage
Piezoelectric Force Microscopy (PFM)

Magnetic Properties*

Magnetic Force Microscopy (MFM)
Tunable MFM

Optical Properties*

Tip-Enhanced Raman Spectroscopy (TERS)
Time-Resolved Photo Current Mapping (PCM)

Electrical Properties*

Conductive AFM
IV Spectroscopy
Scanning Kelvin Probe Microscopy (SKPM/KPM)
SKPM with High Voltage
Scanning Capacitance Microscopy (SCM)
Scanning Spreading-Resistance Microscopy (SSRM)
Scanning Tunneling Microscopy (STM)
Scanning Tunneling Spectroscopy (STS)
Time-Resolved Photo Current Mapping (PCM)

Chemical Properties*

Chemical Force Microscopy with Functionalized Tip
Electrochemical Microscopy (EC-STM and EC-AFM)


AFM Options

Temperature Control

Heating & Cooling Stage (-25ºC~180 ºC)
250 ºC Heating Stage
600 ºC Heating Stage

Liquid Cells

Universal Liquid Cell
Electrochemistry Cell
Open Liquid Cell

Liquid Probehand

Designed for imaging in general liquid environment
Resistant to most buffer solutions including acid
Contact and Non-contact AFM imaging in liquid

Clip-type Chip Carrier

Can be used with unmounted cantilever
Tip bias function available for Conductive AFM and EFM
Tip bias range : -10 V ~ 10 V

Magnetic Field Generator

Applies external magnetic field parallel to sample surface
Tunable magnetic field
Range : -300 ~ 300 gauss
Composed of pure iron core & two solenoid coils


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